> Samsung Fined $400M in FinFET Patent Dispute. - TECH UPDATE

Samsung Fined $400M in FinFET Patent Dispute.






Samsung Fined $400M in FinFET Patent Dispute


Samsung Fined $400M in FinFET Patent Dispute

Samsung Fined $400M in FinFET Patent Dispute
Samsung Fined $400M in FinFET Patent Dispute. Top Two other companies like GlobalFoundries and Qualcomm were also found guilty, but Samsung is the only firm required to pay damages.
FinFETs the three-dimensional transistor structures that replaced conventional bulk silicon beginning in 2012, when Intel has launched its 22nm Tri-Gate FinFETs. FinFETs was a partnership between KAIST and Wonkwang University. In 2012, when Intel released its Tri-Gate transistors, Intel has paid $over 9M to KAIST since it’s introduced to FinFET technology. Samsung says “The FinFet technology we are using is our own technology developed by our employees and executives through studies.







Samsung Fined $400M in FinFET Patent Dispute. Samsung Fined $400M in FinFET Patent Dispute. Reviewed by TECH UPDATE on June 22, 2018 Rating: 5

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